Introduction
and Agenda
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Fred
L. Terry, Jr., presentation at IMA Meeting, March 5, 2002 Optical Topography
(Scatterometry) Research at University of Michigan Fred L. Terry, Jr.
Hsu- Ting Huang, Ji- Woong Lee, Brooke Stutzman, Wei Kong, Pramod Khargonekar
Dept of EECS / University of Michigan
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here
Determination
of Optimal Metrology and Control Strategies for Run- to- Run Control
of Lithography Processes Alan Cheng and James Moyne* The University
of Michigan Electrical Engineering and Computer Science Department *
Brooks Automation Equipment Engineering Solutions Business Unit
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here
To
view Quicktime Movie click
here
To download QuickTime
click on image
IMA
3- 5- 02 A c c e l e r a t i n g Y i e l d Spectroscopic CD for Process
Control 3/ 5/ 02 Ady Levy KLA- Tencor click
here
Optimization
of Scatterometry Optimization of Scatterometry for Integrated Metrology
for Integrated Metrology Boaz Brill Boaz Brill Nova Measuring Instruments
Nova Measuring Instruments click
here
Scatterometry
for Lithography Process Control IMA Meeting, March 2002 click
here
Integrating
Scatterometry for High Volume Manufacturing Alan Nolet, Timbre Technologies,
Inc. A TEL Company
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here
