IMA
Member Abstract Submittals
Nova Measuring Instruments
Ltd
Integrated monitoring of residues, dishing and erosion in Copper
CMP
Avi Ravid (PhD), Amit Weingarten (PhD), Vladimir Machavariani (PhD),
David Kaufman (PhD) and David Scheiner (PhD) , POB 266, Rehovoth 76100
Israel click
here
Brooks Automation
Advancements in Integrated Multi-Process R2R Control Developed
on a Fab-wide Integrated Manufacturing Platform
James Moyne: Brooks Automation Brad Van Eck: International SEMATECH
John Colt: IBM Microelectronics Division Milton Beachy: Agere Systems,
click here
KLA-Tencor Corporation
A Step-by-Step Process for APC Requirements Gathering and Application
Design
By: Paul McGuire KLA-Tencor, Control Solutions Division, click
here
Integration Methodologies for an APC Framework Implementation
Into Heterogeneous Fab IT Environments
By: Dr. Thomas Müller KLA-Tencor, Control Solutions Division,
click
here
Rosetta Stone for the Semiconductor APC Market
By: Alan Weber KLA-Tencor, Control Solutions Division, click
here
Symphone Systems
Improving tool prooductivity through implementation of a dedicated
equipment network and utilizing a suite of open connectivity software
for E-Diagnostics
Jean-Yves Bancilhon, Irina Zaks, Keith Bennett, John Field, Symphony
Systems, Campbell, CA, click
here
Verity Instruments,
Inc.
Use of Spectrograph-based OES for SiN Etch Selectivity and Endpoint
Optimization
F. G. Celii and C. Huffman Texas Instruments, Inc., Dallas, TX, USA
J. Hosch Verity Instruments, Carrollton, TX, USA, click
here
IIS-B Fraunhofer Institute
In situ Particle
Measurement in Loading Stations of Furnaces
Ralph
Trunk, Fraunhofer Institute of Integrated Circuits, Erlangen
Dr. Henry Bernhardt, Infineon Technologies SC300 CmbH & Cp. KG,
Dresden
Matthias von Andrian-Werburg, Fraunhofer Institute of Integrated Circuits,
Erlangen
click
here
In situ
Particle Measurement in Loading Stations of Furnaces
Ralph Trunk, C. Schneider, L Pfitzner, H. Ryssel
Fraunhofer Institute of
Integrated Circuits, Device Technology Division, Erlangen Germany
Olaf Storbeck, Infineon Technologies Dresden click
here
Integrated Metrology into Production Tools using
a Modular Control Architecture
M.Schellenberger, C. Schneider, L. Pfitzner, H.Ryssel, Fraunhofer
Institute of Integrated Circuits, Device Technology Division, Erlangen
Germany click
here
